Reduced visibility conductive micro mesh touch sensor
AssigneeFuturetech Capital, Inc.
InventorsRobert Routh, Michael Morrione, Jeffrey Hawthorne
Life of this patent
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Abstract
A method for fabricating a metallic wire mesh touch sensor with reduced visibility. A metallic wire mesh is formed on a transparent substrate such that the surface of the metallic wires is roughened or textured, so as to cause high scattering of incident light, thereby minimizing specularly reflected light towards the user. The metal lines are formed over patterned catalytic photoresist. The rough or textured surface of the metallic wires is achieved by roughening or texturing the catalytic photoresist, by selecting parameters of electronless plating of copper, or both. An RMS surface roughness of about 50 nm would scatter approximately 70% of incident cyan light incident at 30°.
Claims17
A method for fabricating a metal-mesh touch sensor, comprising:
- providing a transparent substrate;
- forming a catalytic photoresist layer on at least one surface of the transparent substrate, wherein the catalytic photoresist comprises a composition of photoresist and catalytic nanoparticles;
- transferring a pattern onto the catalytic photoresist layer by exposing the catalytic photoresist layer to UV light through a patterned mask;
- developing the catalytic photoresist to form a patterned catalytic photoresist;
- roughening upper surface of the patterned catalytic photoresist to generate a root mean square (RMS) surface roughness of from 40 nm to 60 nm;
- forming a copper layer over the patterned catalytic photoresist by electroless plating;
- and,
- forming a passivation layer over the copper layer.
Dependencies are inferred from the claim text.