Method and an apparatus for producing a film of carbon nitride material
AssigneeCity University of Hong Kong
InventorsRuiqin Zhang, Wei Xiong, Miaoyan Huang, Haoran Tian
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Abstract
A method of producing a film of carbon nitride material, including the steps of providing a precursor of the carbon nitride material in a reacting vessel and a substrate substantially above the precursor of the carbon nitride material; heating the reacting vessel, the precursor of the carbon nitride material and the substrate at the first predetermined temperature; and quenching the reacting vessel to reach the second predetermined temperature; wherein the film of carbon nitride material is formed on a surface of the substrate during the quenching of the reacting vessel.
Claims14
A method of producing a film of carbon nitride material using a rapid thermal vapor condensation process, comprising the steps of:
- disposing a precursor of the carbon nitride material in a reacting vessel and a substrate substantially above the precursor of the carbon nitride material, wherein the reacting vessel includes a 15 mL crucible;
- heating the reacting vessel, the precursor of the carbon nitride material and the substrate at a first predetermined temperature for a predetermined amount of time shorter than or equal to 20 minutes;
- and
- quenching the reacting vessel to reach a second predetermined temperature;
- wherein the film of carbon nitride material is formed on a surface of the substrate during the quenching of the reacting vessel.
The method of 1, further comprising the step of preparing a mash including the precursor of the carbon nitride material.
Dependencies are inferred from the claim text.