Metal complexes for depositing films and method of making and using the same

A method for catalytic hydrosilylation of a starting compound, said method comprising steps of:

• contacting said starting compound with a hydrosilylation reagent in the presence of a hydrosilylation catalyst comprising a metal-ligand complex or a hydrosilylation precatalyst comprising said metal-ligand complex;
• and
• activating hydrosilylation of said starting compound;
• and
• wherein said metal-ligand complex comprises at least one ligand and is characterized by formula (FX1):
• MLxDy(FX1),
• where:
• M is a metal selected from the group consisting of Li, Be, Mg, Ca, Sr, Ba, Al, Sc, Ga, Sn, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, a lanthanide metal, and an actinide metal;
• x is equal to the oxidation state of M;
• each D is independently a neutral coordinating ligand;
• y is zero or an integer selected from the range of 1 to 4;
• and
• each L is a mono-anionic ligand independently characterized by the formula FX2:
• where:
• each R1 and R2 is independently selected from the group consisting of a halide and a substituted or unsubstituted C1-C6 alkyl, C3-C8 cycloalkyl, C3-C8 heterocycloalkyl, C1-C6 haloalkyl, C6-C10 alkylaryl, C1-C6 alkoxy, C6-C10 aryl, C6-C10 heteroaryl, silyl, C2-C8 alkenyl, C2-C8 alkynyl, C1-C6 hydroxyl, C3-C10 arylene, C3-C10 heteroarylene, C2-C10 alkenylene, C3-C10 cycloalkenylene, C2-C10 alkynylene, or any combination thereof;
• each of R3, R4, R5, R6, R7, R8, and R9 is independently selected from the group consisting of a hydrogen, a halide, and a substituted or unsubstituted C1-C6 alkyl, C3-C8 cycloalkyl, C3-C8 heterocycloalkyl, C1-C6 haloalkyl, C6-C10 alkylaryl, C1-C6 alkoxy, C6-C10 aryl, C6-C10 heteroaryl, silyl, C2-C8 alkenyl, C2-C8 alkynyl, C1-C6 hydroxyl, C3-C10 arylene, C3-C10 heteroarylene, C2-C10 alkenylene, C3-C10 cycloalkenylene, C2-C10 alkynylene, or any combination thereof;
• and
• E is C or Si.