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AssigneeShin-Etsu Handotai Co., Ltd.
InventorsTsuyoshi Ohtsuki, Masaro Tamatsuka
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An anodic-oxidation equipment for forming a porous layer on a substrate to be treated, including: an electrolytic bath filled with an electrolytic solution; an anode and a cathode disposed in the electrolytic solution; and a power supply for applying current between the anode and the cathode in the electrolytic solution, wherein the anode is the substrate to be treated, and the cathode is a silicon substrate having a surface on which a nitride film is formed. This provides a cathode material in anodic-oxidation for forming porous silicon by an electrochemical reaction in an HF solution, the cathode material having a resistance to electrochemical reaction in an HF solution and no metallic contamination, etc., and furthermore, being less expensive than a conventional cathode material. Furthermore, high-quality porous silicon is provided at a lower cost than has been conventional.
An anodic-oxidation equipment for forming a porous layer on a substrate to be treated, comprising:
An anodic-oxidation method for applying current between an anode and a cathode in an electrolytic solution to form a porous layer on a substrate to be treated disposed in the electrolytic solution, wherein
A method for producing a cathode of an anodic-oxidation equipment, wherein
Dependencies are inferred from the claim text.