Alkali-free glass substrate, laminated substrate, and glass substrate production method
AssigneeAGC Inc.
InventorsShuhei Nomura, Kazutaka Ono
Life of this patent
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Abstract
An alkali-free glass substrate which is a glass substrate includes, as represented by molar percentage based on oxides, 0.1% to 10% of ZnO. The alkali-free glass substrate has an average coefficient of thermal expansion α50/100 at 50 to 100° C. of from 2.70 ppm/° C. to 3.20 ppm/° C., an average coefficient of thermal expansion α200/300 at 200 to 300° C. of from 3.45 ppm/° C. to 3.95 ppm/° C., and a value α200/300/α50/100 obtained by dividing the average coefficient of thermal expansion α200/300 at 200 to 300° C. by the average coefficient of thermal expansion α50/100 at 50 to 100° C. of from 1.20 to 1.30.
Claims13
An alkali-free glass substrate which is a glass substrate consisting of, as represented by molar percentage based on oxides,
- SiO2:
- from 50% to 67%,
- Al2O3:
- from 11% to 16%,
- B2O3:
- from 0% to 15%,
- MgO:
- from 0% to 15%,
- CaO:
- from 0% to 13%,
- SrO:
- from 1% to 11%,
- BaO:
- from 0% to 9.5%, and
- 0.1% to 10% of ZnO,
- having a total content of MgO, CaO, SrO, BaO, and ZnO combined of 15% or more,
- optionally containing one or more components selected from the group consisting of Fe2O3, SO3, Cl, F, Li2O, WO3, Nb2O5, V2O5, Bi2O3, MoO3, P2O5, Ga2O3, I2O5, In2O5, Ge2O5, ZrO2, Y2O3, La2O3, TiO2, and SnO2,
- and having an average coefficient of thermal expansion α50/100 at 50 to 100° C. of from 2.70 ppm/° C. to 3.20 ppm/° C.,
- an average coefficient of thermal expansion α100/200 at 100 to 200° C. of from 3.13 ppm/° C. to 3.63 ppm/° C.,
- an average coefficient of thermal expansion α200/300 at 200 to 300° C. of from 3.45 ppm/° C. to 3.95 ppm/° C., and
- a value α200/300/α50/100 obtained by dividing the average coefficient of thermal expansion α200/300 at 200 to 300° C. by the average coefficient of thermal expansion α50/100 at 50 to 100° C. of from 1.20 to 1.30.
Dependencies are inferred from the claim text.