Semiconductor device and method of manufacturing semiconductor device

A semiconductor device comprising:

• a silicon carbide substrate of a first conductivity type;
• a first silicon carbide layer of the first conductivity type, disposed on a front surface of the silicon carbide substrate and having an impurity concentration lower than that of the silicon carbide substrate;
• a base region of a second conductivity type, disposed in a surface region of the first silicon carbide layer;
• a second silicon carbide layer of the second conductivity type, disposed on a surface of the first silicon carbide layer;
• a first region of the first conductivity type, disposed in the second silicon carbide layer so as to penetrate from a front surface of the second silicon carbide layer through the second silicon carbide layer and contact the first silicon carbide layer, the first region having an impurity concentration lower than that of the silicon carbide substrate;
• a source region of the first conductivity type, disposed in a surface region of the second silicon carbide layer, separate from the first region, the source region having an impurity concentration higher than that of the first region;
• a contact region of the second conductivity type, disposed in the second silicon carbide layer so as to penetrate from the front surface of the second silicon carbide layer through the second silicon carbide layer and contact the base region, the contact region having an impurity concentration higher than that of the base region;
• a source electrode disposed so as to contact the source region and the contact region;
• a gate insulating film disposed on the front surface of the second silicon carbide layer;
• a gate electrode that is disposed on the gate insulating film;
• a drain electrode disposed on a back surface of the silicon carbide substrate;
• and
• a lifetime killer introduction region in which a lifetime killer is implanted, the lifetime killer introduction region having a first part and a second part, the first part being disposed along and at an interface region of the first silicon carbide layer and a bottom surface of the base region, the bottom surface of the first base region facing the silicon carbide substrate, the second part being disposed in the first silicon carbide layer, and abutting the first part.

A method of manufacturing a semiconductor device, the method comprising:

• forming a silicon carbide layer of a first conductivity type on a front surface of a silicon carbide substrate of the first conductivity type;
• forming a first region of a second conductivity type in a surface region of the silicon carbide layer;
• forming a source region and a contact region in a surface region of the first region;
• forming a source electrode on the contact region and the source region;
• forming a gate insulating film on a portion of the silicon carbide layer;
• forming a gate electrode on the gate insulating film;
• forming a lifetime killer introduction region by implanting a life lifetime killer from a back surface of the silicon carbide substrate, wherein the lifetime killer introduction region has a first part and a second part, the first part being disposed along and at an interface region of the silicon carbide layer and a bottom surface of the first region, the bottom surface of the first region facing the silicon carbide substrate, each of the first part and the bottom surface of the first region having a planar surface that is beneath the gate electrode, the source electrode and the contact region, the second part being disposed in the silicon carbide layer, and abutting the first part;
• and
• forming a drain electrode on the back surface of the silicon carbide substrate after introducing the lifetime killer.

A method of manufacturing a semiconductor device, the method comprising:

• forming a first silicon carbide layer of a first conductivity type on a front surface of a silicon carbide substrate of the first conductivity type;
• forming a base region of a second conductivity type in a portion of a surface region of the first silicon carbide layer;
• forming a second silicon carbide layer of the second conductivity type on the first silicon carbide layer;
• forming a second region of the second conductivity type in a surface of the second silicon carbide layer;
• forming a source region and a contact region in the second region of the second conductivity type;
• forming a source electrode on the source region and the contact region;
• forming a gate insulating film on a portion of the second silicon carbide layer;
• forming a lifetime killer introduction region by implanting a lifetime killer from a back surface of the silicon carbide substrate, wherein the lifetime killer introduction region has a first part and a second part, the first part being disposed along and at an interface region of the first silicon carbide layer and a bottom surface of the base region, the bottom surface of the first base region facing the silicon carbide substrate, the second part being disposed in the first silicon carbide layer, and abutting the first part;
• and
• forming a drain electrode on the back surface of the silicon carbide substrate after introducing the lifetime killer.