Semiconductor device, method of manufacturing semiconductor device, power conversion device
AssigneeMitsubishi Electric Corporation
InventorTetsuo Takahashi
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AssigneeMitsubishi Electric Corporation
InventorTetsuo Takahashi
Estimating the term…
A semiconductor device including a first conductivity type substrate, a first conductivity type carrier store layer formed on an upper surface side of the substrate, a second conductivity type channel dope layer formed on the carrier store layer, a first conductivity type emitter layer formed on the channel dope layer, a gate electrode in contact with the emitter layer, the channel dope layer and the carrier store layer via a gate insulating film, and a second conductivity type collector layer formed on a lower surface side of the substrate, wherein the gate insulating film has a first part in contact with the emitter layer and the channel dope layer, a second part in contact with the carrier store layer, and a third part in contact with the substrate, and at least a part of the second part is thicker than the first part and the third part.
A semiconductor device comprising:
A semiconductor device comprising:
Dependencies are inferred from the claim text.