Protective layers for processing chamber components

A processing component, comprising:

• a chamber body formed of an aluminum alloy;
• a tantalum layer disposed on an interior surface of the chamber body;
• a tantalum nitride layer disposed on the tantalum layer;
• and
• an aluminum oxide layer disposed on the tantalum nitride layer.

An article, comprising:

• an aluminum alloy substrate for use in a plasma processing chamber, the aluminum alloy substrate comprising one of a gas injector, a showerhead, a chamber liner, or a shield;
• a tantalum nitride layer disposed on the aluminum alloy substrate;
• a tantalum layer disposed on the tantalum nitride layer;
• and
• an aluminum oxide layer disposed on the tantalum layer.

A processing article, comprising:

• an aluminum alloy substrate comprising an interior surface of a plasma processing chamber or a processing component for use in the plasma processing chamber;
• and
• a protective layer stack disposed on a surface of the aluminum alloy substrate, the protective layer stack comprising:
• a tantalum layer;
• a tantalum nitride layer;
• and
• a ceramic layer consisting essentially of aluminum oxide.