Multi-beam particle beam system

A particle beam system, comprising:

• a particle source configured to generate a particle beam;
• a multi-aperture arrangement, comprising:
• a first multi-aperture plate configured to split the particle beam generated by the particle source into a multiplicity of particle beams;
• and
• a second multi-aperture plate downstream of the first multi-aperture plate;
• and
• an objective lens system comprising a particle-optical lens to focus the multiplicity of particle beams at an object plane;
• wherein the second multi-aperture plate comprises:
• a silicon layer;
• an insulation layer disposed on the silicon layer;
• a plurality of apertures each extending through the silicon layer and the insulation layer;
• a conductive material disposed on a portion of an inner wall of each aperture defined by the silicon layer to define a ring electrode;
• metal in openings in the insulation layer to define metal contacts electrically connected to one of the ring electrodes;
• a plurality of conductor tracks disposed on the insulation layer;
• a passivation layer covering the conductor tracks an portions of the insulation layer;
• and
• a metal layer disposed on the passivation layer,
• wherein the conductor tracks are connected to the metal contacts so that voltages are suppliable to the ring electrodes via the conductor tracks.