Method and system for correcting two-fold, fifth-order parasitic aberrations in charged particle systems

A correction system for correcting fifth-order, two-fold aberrations in a charged particle system, the correction system comprising:

• a spherical aberration corrector that generates a negative CS, an objective lens that generates a positive CS;
• and
• a quadrupole positioned between the spherical aberration corrector and the objective lens at an axial crossover of a charged particle beam, wherein the quadrupole generates a quadrupole field when an excitation is applied to the quadrupole, and wherein the quadrupole field corrects the fifth-order, two-fold aberration when the charged particle system is in use.

A charged particle microscope comprising:

• a charged particle source configured to emit a charged particle beam toward a sample;
• an optical column configured to focus the charged particle beam onto the sample, wherein the optical column comprises a correction system configured to correct a parasitic fifth-order, two-fold aberration in the charged particle microscope, the correction system comprising:
• a quadrupole that generates a quadrupole field when an excitation is applied to the quadrupole, wherein the quadrupole is positioned between the charged particle source and the sample, and the quadrupole field corrects the parasitic fifth-order, two-fold aberration in the charged particle microscope.