Support substrate for radioisotope production, target plate for radioisotope production, and production method for support substrate
AssigneeKaneka Corporation
InventorsMutsuaki Murakami, Atsushi Tatami, Masamitsu Tachibana
Life of this patent
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Abstract
Provided is a target plate for radioisotope production that has sufficient durability and sufficient heat resistance for use in radioisotope production and that is capable of reducing the extent of radioactivation. In a target plate for radioisotope production, a support substrate, which supports a target, includes a graphite film(s). The thermal conductivity in a surface direction of the graphite film(s) is 1200 W/(m·K) or greater, and the thickness of the graphite film(s) is 0.05 μm or greater and 100 μm or less.
Claims8
A support substrate for radioisotope production, the support substrate being configured to support a target for receiving charged particle beam irradiation, the support substrate consisting essentially of two or more graphite films, wherein:
- the two or more graphite films are placed such that a surface thereof intersects a charged particle beam,
- the two or more graphite films each have a thermal conductivity, in a surface direction, of 1200 W/(m·K) or greater,
- the two or more graphite films each have a thickness of 0.05 μm or greater and less than 100 μm,
- the support substrate includes a stack of the two or more graphite films;
- and the support substrate has a total thickness of 0.1 μm or greater and 1 mm or less.
Dependencies are inferred from the claim text.