Adjustment assembly and substrate exposure system comprising such an adjustment assembly
AssigneeASML Netherlands B.V.
InventorJerry Johannes Martinus Peijster
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AssigneeASML Netherlands B.V.
InventorJerry Johannes Martinus Peijster
Estimating the term…
The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, an exposure apparatus for exposing said substrate, and adjustment assembly for adjusting the position of the exposure apparatus with respect to the substrate support module. The adjustment assembly comprises a hydraulic actuator, a hydraulic generator and a conduit, wherein the conduit interconnects said hydraulic actuator and said hydraulic generator for forming a hydraulic system. The exposure apparatus, the frame, the adjustment assembly and the substrate support module are arranged as parts of a series of mechanically linked components. A first part of said series of mechanically linked components comprises the exposure apparatus, and a second part comprises the substrate support module. Said hydraulic actuator is arranged between said first part and said second part. Preferably the hydraulic actuator comprises a first bellows and the hydraulic generator comprises a second bellows.
A mechanical adjustment assembly for adjusting a position of a first part of a series of mechanically linked components with respect to a second part of the series of mechanically linked components,
Method for adjusting a position of a first part of a series of mechanically linked components with respect to a second part of the series of mechanically linked components, comprising:
Substrate exposure system comprising:
Dependencies are inferred from the claim text.