EUV pellicles
AssigneeASML Netherlands B.V.
InventorsZomer Silvester Houweling, Chaitanya Krishna Ande, Dennis De Graaf, Thijs Kater, Michael Alfred Josephus Kuijken, Mahdiar Valefi
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Abstract
A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.
Claims20
A pellicle for a lithographic apparatus, the pellicle comprising a metal oxysilicide layer.
A pellicle for a lithographic apparatus, the pellicle comprising a molybdenum layer disposed between a ruthenium layer and a silicon oxynitride layer.
A method of manufacturing a pellicle for a lithographic apparatus, the method comprising providing a metal oxysilicide layer as part of forming the pellicle.
A method of manufacturing a pellicle for a lithographic apparatus, the method comprising providing a molybdenum layer disposed between a ruthenium layer and a silicon oxynitride layer as part of forming the pellicle.
Dependencies are inferred from the claim text.