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US 11,237,441 B2Granted
Array substrate and manufacturing method thereof, display device
AssigneesHefei Xinsheng Optoelectronics Technology Co., Ltd., Boe Technology Group Co., Ltd.
InventorsXinjie Zhang, Chengwei Liu
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Abstract
The present disclosure relates to an array substrate and a manufacturing method thereof, a display device. The manufacturing method of the array substrate includes: upon manufacturing of a gate layer, connecting a gate line in the gate layer with a signal line electrically; and after manufacturing of an active layer is completed, disconnecting electrical connection of the gate line with the signal line.
Claims9
An array substrate manufacturing method comprising:
- forming a gate layer, the gate layer comprises a gate line and a signal line which are connected electrically, wherein forming the gate layer comprises:
- forming a connection lead between the gate line and the signal line, two ends of the connection lead connect with the gate line and the signal line respectively;
- forming a gate insulation layer on the gate layer, wherein forming the gate insulation layer on the gate layer comprises forming a gate insulation material film on the gate layer;
- and forming the gate insulation layer by patterning the gate insulation material film and exposing the connection lead;
- forming an active layer;
- and
- forming a source-drain layer on the gate insulation layer after forming the active layer, wherein forming the source-drain layer on the gate insulation layer comprises removing the connection lead.
4 more elements
Dependencies are inferred from the claim text.