Multi-probe ferromagnetic resonance (FMR) apparatus for wafer level characterization of magnetic films

A method comprising:

• providing a wafer having one or more magnetic materials positioned at locations on the wafer;
• providing a plurality of RF probes over the wafer, wherein each RF probe is disposed over at least one of the one or more magnetic materials positioned at locations on the wafer;
• applying a magnetic field from a magnetic field source and applying one or more microwave frequencies from the plurality of RF probes to establish a FMR condition at each location of the one or more magnetic materials on the wafer;
• receiving, by one or more RF diodes, a RF output signal from the one or more RF probes when the FMR condition occurs at each of the locations;
• and
• receiving, by the controller, an output signal from each RF diode, and wherein the output signal is indicative of one or more magnetic properties.

A ferromagnetic resonance (FMR) measurement system comprising:

• a wafer table holding a wafer having one or more magnetic materials positioned at locations on the wafer;
• a plurality of RF probes disposed over the wafer such that at least one RF probe is disposed over each of the locations having the one or more magnetic materials, wherein each RF Probe is operable to transmit a RF input signal to the one or more magnetic materials positioned at the locations on a wafer;
• a magnetic field source operable to provide a magnetic field proximate to each of the plurality of RF probes such that an application of the RF input signal at one or more microwave frequencies and the magnetic field induces a FMR condition in the one or more magnetic materials at each of the locations on the wafer;
• one or more RF diodes operable to obtain a RF output signal from one or more RF probes when the FMR condition occurs at each of the locations;
• and
• a controller operable to receive an output signal from each RF diode, and wherein the output signal is indicative of one or more magnetic properties.