Apparatus and method for processing a substrate
AssigneeSPTS Technologies Limited
InventorsMartin Ayres, John MacNeil, Trevor Thomas
Life of this patent
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Abstract
An apparatus for electrochemically processing a semiconductor substrate includes a processing chamber of the type that is sealable to a peripheral portion of a semiconductor substrate so as to define a covered processing volume. The semiconductor substrate is supported by a substrate support. A magnetic arrangement is disposed outside of the processing chamber and produces a magnetic field. The magnetic field is changed using a controller for controlling the magnetic arrangement. An agitator is disposed within the processing chamber. The agitator comprises a magnetically responsive element which is responsive to changes in the magnetic field of the magnetic arrangement so as to provide a reciprocating motion to the agitator.
Claims17
An apparatus for electrochemically processing a semiconductor substrate, the apparatus comprising:
- a processing chamber that is sealable to a peripheral portion of a semiconductor substrate so as to define a covered processing volume;
- a substrate support for supporting the semiconductor substrate;
- a magnetic arrangement disposed outside of the processing chamber, the magnetic arrangement producing a magnetic field;
- a controller for controlling the magnetic arrangement so as to change the magnetic field;
- and
- an agitator disposed within the processing chamber, the agitator comprising a magnetically responsive element which is responsive to changes in the magnetic field of the magnetic arrangement through a side wall of the processing chamber so as to provide a reciprocating motion to the agitator.
Dependencies are inferred from the claim text.