Film-forming apparatus

A film-forming apparatus comprising:

• a processing container having a vacuum atmosphere therein;
• a stage having a heater and disposed in the processing container to load a substrate thereon;
• a gas discharge mechanism provided at a position to face the stage;
• and
• an exhaust part configured to exhaust an inside of the processing container,
• wherein the gas discharge mechanism includes:
• a gas intake port configured to introduce a processing gas into the processing container;
• a first plate-shaped member having a first opening formed in a more radially outward position than the gas intake port;
• and
• a shower plate disposed between the first plate-shaped member and the stage to supply the processing gas from the first opening to a process space through a plurality of gas holes,
• wherein a cover ring is engaged with an outer periphery of the stage and the processing gas is exhausted radially outward by an exhaust hole formed between a bottom surface of the shower plate and a top surface of the cover ring.