Multi zone substrate support for ALD film property correction and tunability

A substrate support for a substrate processing system configured to perform a deposition process, the substrate support comprising:

• a baseplate;
• a plurality of zones;
• and
• a heater layer provided on the baseplate, wherein the heater layer includes a plurality of resistive heaters arranged throughout the plurality of zones, wherein the plurality of resistive heaters includes separately-controllable resistive heaters arranged in respective ones of the plurality of zones,
• wherein the plurality of zones includes a central zone, at least one middle zone radially outside of the central zone, and at least one outer edge zone radially outside of the at least one middle zone, and
• wherein the plurality of resistive heaters includes a first resistive heater in the at least one outer edge zone, and wherein the first resistive heater extends radially outside of an outer edge of a substrate to be processed on the substrate support.