Atomic layer deposition device for massively coating micro-nano particles
AssigneeHuazhong University of Science and Technology
InventorsRong Chen, Jiawei Li, Bin Shan, Xiao Liu, Kai Qu, Jing Zhang
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AssigneeHuazhong University of Science and Technology
InventorsRong Chen, Jiawei Li, Bin Shan, Xiao Liu, Kai Qu, Jing Zhang
Estimating the term…
An atomic layer deposition device for massively coating micro-nano particles, includes a reaction chamber and a particle container, in which an inlet port is provided at a lower end of the reaction chamber, and an inlet pipe for introducing a precursor or a carrier gas is provided in the inlet port; a chamber door is provided at an upper end of the reaction chamber, so that the particle container can be freely placed in or removed out of the reaction chamber; an air inlet hole is provided at a lower end of the particle container, and the inlet pipe enters the particle container through the air inlet hole.
An atomic layer deposition device for massively coating micro-nano particles, wherein the device comprises a reaction chamber with a cylindrical vertical structure, and a particle container coaxially sleeved in the reaction chamber, wherein the reaction chamber comprises an inlet port provided at a lower end thereof, a chamber door and a flange interface provided at an upper end thereof, a lead-in electrode provided at a side thereof, and a heating belt provided in an inner chamber thereof, wherein the inlet port is sealingly mounted with an inlet pipe for introducing a precursor or a carrier gas, and the flange interface is connected to a vacuum pump for providing a desired vacuum environment for the inner chamber of the reaction chamber;
Dependencies are inferred from the claim text.