Deposition system with shield mount
AssigneeApplied Materials, Inc.
InventorsVibhu Jindal, Sanjay Bhat
Life of this patent
Estimating the term…
Abstract
A deposition system and a method of operation thereof are disclosed. A PVD chamber is disclosed comprising a plurality of cathode assemblies, a rotating shield below the plurality of cathode assemblies to expose one of the plurality cathode assemblies through the shroud and through a shield hole of the shield, the shield comprising a top surface including a raised peripheral frame. A shield mount sized and shaped to engage with the raised peripheral frame to secure the shield mount to the shield.
Claims20
A physical vapor deposition (PVD) chamber comprising:
- a plurality of cathode assemblies positioned over a plurality of targets and configured to deposit material on a substrate positioned below the plurality of targets;
- a rotating shield positioned below the plurality of cathode assemblies and the plurality of targets, the rotating shield including a shield hole configured to expose one of the plurality of targets through the shield hole, the rotating shield comprising a top surface and a raised peripheral frame extending from the top surface and defining a receiving pocket;
- a shield motor coupled to a shield motor shaft coupled to a collet;
- and
- a shield mount sized and shaped to engage with the raised peripheral frame to lock an edge of the shield mount to the shield within the receiving pocket, wherein the collet is fastened to the shield mount.
A physical vapor deposition (PVD) chamber comprising:
- a plurality of cathode assemblies positioned over a plurality of targets and configured to deposit material on a substrate positioned below the plurality of targets;
- a rotating shield positioned below the plurality of cathode assemblies and the plurality of targets, the rotating shield including a shield hole configured to expose one of the plurality of targets through the shield hole, the rotating shield comprising a top surface including a raised peripheral frame extending from the top surface and defining a receiving pocket;
- a shield mount sized and shaped to engage with the raised peripheral frame and the receiving pocket to secure and lock the shield mount to the shield;
- a collet secured to the shield mount;
- and
- a shield motor shaft secured to the collet and secured to a shield motor that rotates the shield motor shaft and the shield.
A method of depositing a material layer comprising:
- placing a substrate in a PVD chamber comprising a plurality of cathode assemblies;
- rotating a shield below the plurality of cathode assemblies to expose one of the plurality of cathode assemblies through a shield hole of the shield, a shield mount comprising a top surface including a raised peripheral frame extending from the top surface and defining a receiving pocket, the shield secured to the shield mount sized and shaped to engage with the raised peripheral frame and the receiving pocket to secure and lock the shield mount to the shield;
- and
- depositing the material layer on the substrate.
Dependencies are inferred from the claim text.