Aqueous based dust control compositions and methods
AssigneeTrican Well Service Ltd.
InventorsChuanzhong Wang, Harvey Quintero, Kewei Zhang, Bill O'Neil, Sebastian Sessarego
Life of this patent
Estimating the term…
Abstract
Compositions and methods of reducing release of fugitive dust from particulate substrates are provided. The method involves applying a composition onto the substrate in an amount effective to reduce dust release and remain effective for an extended period of time, wherein the composition comprises an aqueous medium, a surface modifying agent, and a dispersant.
Claims23
A method of reducing release of fugitive dust from a particulate substrate prone to dust release comprising applying a composition onto the substrate in an amount effective to reduce dust release, wherein the composition consists essentially of an aqueous medium, at least one surface modifying agent, and at least one dispersant, wherein
- the surface modifying agent is selected from one or more of:
- ammonium compounds, urea and derivatives thereof, and glycine and derivatives thereof, and
- the composition comprises 10-30 percent w/w of surface modifying agent, and 3-50 percent w/w of dispersant with a remainder being the aqueous medium to 100 percent.
A fugitive dust control composition consisting essentially of an aqueous medium, at least one surface modifying agent, and at least one dispersant, wherein the surface modifying agent is selected from one or more of:
- quaternary ammonium salts, urea and derivatives thereof, and glycine and derivatives thereof, wherein the dispersant is a glycol or polyol selected from one or more of the group consisting of:
- glycol ethers, glycerol, ethylene glycol and propylene glycol, and wherein the composition comprises 10-30 percent surface modifying agent, and 5-50 percent dispersant with a remainder being the aqueous medium to 100 percent.
Dependencies are inferred from the claim text.