Display device

A display device comprising:

• a substrate;
• a gate pattern disposed on the substrate;
• an oxide semiconductor layer disposed on the substrate, the oxide semiconductor layer includes a channel region that overlaps with the gate pattern;
• and
• an insulating film disposed on an upper portion of the gate pattern,
• wherein the gate pattern includes a plurality of gate holes, wherein the gate holes are formed inside a region of the gate pattern that does not overlap with the channel region of the oxide semiconductor layer,
• wherein the insulating film is configured to provide majority carrier supporting ions to the channel region of the oxide semiconductor layer via the plurality of gate holes, and
• a concentration of the majority carrier supporting ions is substantially uniform in the channel region of the oxide semiconductor layer.