Generating a training set usable for examination of a semiconductor specimen
AssigneeApplied Materials Israel Ltd.
InventorsElad Ben Baruch, Shalom Elkayam, Shaul Cohen, Tal Ben-Shlomo
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AssigneeApplied Materials Israel Ltd.
InventorsElad Ben Baruch, Shalom Elkayam, Shaul Cohen, Tal Ben-Shlomo
Estimating the term…
There is provided a system and method of generating a training set for training a Deep Neural Network usable for examination of a specimen. The method includes: for each given training image in a group: i) generating a first batch of training patches, including cropping the given training image into a first plurality of original patches; and augmenting at least part of the first plurality of original patches in order to simulate variations caused by a physical process of the specimen; and ii) generating a second batch of training patches, including: shifting the plurality of first positions on the given training image to obtain a second plurality of original patches, and repeating the augmenting to the second plurality of original patches to generate a second plurality of augmented patches; and including at least the first second batches of training patches corresponding to each given training image in the training set.
A computerized method for generating a training set for training a Deep Neural Network (DNN) usable for examination of a specimen, the method performed by a processor and memory circuitry (PMC), the method comprising:
A computerized system of generating a training set for training a Deep Neural Network (DNN) usable for examination of a specimen, the system comprising a processor and memory circuitry (PMC) configured to perform operations comprising:
A non-transitory computer readable storage medium tangibly embodying a program of instructions that, when executed by a computer, cause the computer to perform a method of generating a training set for training a Deep Neural Network (DNN) usable for examination of a specimen, the method comprising:
Dependencies are inferred from the claim text.