US 11,231,573 B2Granted

Position detection apparatus, exposure apparatus, and article manufacturing method

AssigneeCanon Kabushiki Kaisha

InventorsHironobu Fujishima, Hironori Maeda

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Abstract

Position detection apparatus includes illumination optical system for illuminating target, detection optical system for forming image of the illuminated target illuminated on photoelectric converter, first array having first aperture stops, second array having second aperture stops, first driving mechanism for arranging the selected first aperture stop on pupil of the illumination optical system by driving the first array such that first aperture stop crossing optical axis of the illumination optical system moves in first direction, second driving mechanism for arranging the selected second aperture stop on pupil of the detection optical system by driving the second array such that second aperture stop crossing optical axis of the detection optical system moves in second direction. The first and second driving mechanisms fine-tune positions of the selected first and second aperture stops in the first and second directions, respectively.

Claims12

Dependent claims

A position detection apparatus comprising:

a photoelectric converter;
an illumination optical system configured to illuminate a target;
a detection optical system configured to form an image of the target illuminated with light from the illumination optical system on a light-receiving surface of the photoelectric converter;
a first array having a plurality of first aperture stops configured to be arranged on a pupil of the illumination optical system;
a second array having a plurality of second aperture stops configured to be arranged on a pupil of the detection optical system;
a first driving mechanism configured to arrange a first aperture stop, selected from the plurality of first aperture stops, which crosses an optical axis of the illumination optical system, on the pupil of the illumination optical system by driving the first array such that the first aperture stop moves in a first direction;
and
a second driving mechanism configured to arrange a second aperture stop, selected from the plurality of second aperture stops, which crosses an optical axis of the detection optical system, on the pupil of the detection optical system by driving the second array such that the second aperture stop moves in a second direction,
wherein the first driving mechanism is further configured to tune a position of the selected first aperture stop in the first direction, and the second driving mechanism is further configured to tune the selected second aperture stop in the second direction,
wherein when the first driving mechanism drives the first aperture stop in the first direction, a light beam from the target moves on the pupil of the detection optical system in a third direction intersecting with the second direction.

7 more elements

An article manufacturing method comprising:

exposing a substrate to light by using an exposure apparatus, the exposure apparatus comprising:
a photoelectric converter;
an illumination optical system configured to illuminate a target;
a detection optical system configured to form an image of the target illuminated with light from the illumination optical system on a light-receiving surface of the photoelectric converter;
a first array having a plurality of first aperture stops configured to be arranged on a pupil of the illumination optical system;
a second array having a plurality of second aperture stops configured to be arranged on a pupil of the detection optical system;
a first driving mechanism configured to arrange a first aperture stop, selected from the plurality of first aperture stops, which crosses an optical axis of the illumination optical system, on the pupil of the illumination optical system by driving the first array such that the first aperture stop moves in a first direction;
and
a second driving mechanism configured to arrange a second aperture stop, selected from the plurality of second aperture stops, which crosses an optical axis of the detection optical system, on the pupil of the detection optical system by driving the second array such that the second aperture stop-moves in a second direction,
wherein the first driving mechanism is further configured to tune a position of the selected first aperture stop in the first direction, and the second driving mechanism is further configured to tune the selected second aperture stop in the second direction;
wherein when the first driving mechanism drives the first aperture stop in the first direction, a light beam from the target moves on the pupil of the detection optical system in a third direction intersecting with the second direction;
and
processing the substrate having undergone the exposing,
wherein an article is manufactured from the substrate having undergone the processing.

11 more elements

Dependencies are inferred from the claim text.

Facts

Application: 16/826,458Filed 23 Mar 2020
Priority: JP JP2019-0707122 Apr 2019
Published: US 2020/0319447 A18 Oct 2020
Granted: 25 Jan 2022
Term ends: Not estimatedThe source records don’t support an estimate.

Classification9 codes

G02B 21/10
Condensers: affording dark-field illumination
G01B 11/26
Measuring arrangements characterised by the use of optical techniques: for measuring angles or tapers; for testing the alignment of axes
G02B 21/0016
Specially adapted for specific applications: technical microscopes, e.g. for inspection or measuring in industrial production processes
G02B 21/361
Arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing…:…