Waveguide manufacturing process
AssigneeCommissariat A L'energie Atomique Et Aux Energies Alternatives
InventorsCorrado Sciancalepore, Houssein El Dirani, Jean-Michel Hartmann
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Abstract
The invention relates to a method for manufacturing a waveguide (2a, 2b) comprising: A supplying of a substrate (1) comprising a stack of a first layer (11) based on a first material on a second layer (12) based on a second material, and at least one sequence successively comprising: An etching of the first material, in such a way as to define at least one pattern (20, 22a) having etching flanks (200, 201), A smoothing annealing assisted by hydrogen in such a way as to smooth the etching flanks (200, 201) of the at least one pattern (20, 22a), A re-epitaxy of the first material on the pattern (20, 22a) based on the first material.
Claims15
A method for manufacturing a waveguide comprising:
- a supplying of a substrate comprising a stack of a first layer based on a first material on a second layer based on a second material, and
- at least one sequence successively comprising:
- i. an etching of the first material over an entire thickness of the first layer, in such a way as to define at least one pattern having etching flanks,
- ii. a smoothing annealing assisted by hydrogen in such a way as to smooth the etching flanks of the at least one pattern,
- iii. in epitaxy of the first material on the pattern based on the first material, said epitaxy being carried out on the flanks and an apex of the pattern.
Dependencies are inferred from the claim text.