Resin material, vinyl bag, polycrystalline silicon rod, polycrystalline silicon mass
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsShuichi Miyao, Shigeyoshi Netsu, Kazunori Watanabe
Life of this patent
Estimating the term…
Loading patent…
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsShuichi Miyao, Shigeyoshi Netsu, Kazunori Watanabe
Estimating the term…
According to the present invention, a resin material that has the following surface concentration of impurities is consistently used in production of polycrystalline silicon. Values obtained from quantitative analysis by ICP-mass spectrometry using a 1 wt % nitric acid aqueous solution as an extraction liquid are: a phosphorous (P) concentration of 50 pptw or less; an arsenic (As) concentration of 2 pptw or less; a boron (B) concentration of 20 pptw or less; an aluminum (Al) concentration of 10 pptw or less; a total concentration of 6 elements of iron (Fe), chromium (Cr), nickel (Ni), copper (Cu), sodium (Na), and zinc (Zn) of 80 pptw or less; a total concentration of 10 elements of lithium (Li), potassium (K), calcium (Ca), titanium (Ti), manganese (Mn), cobalt (Co), molybdenum (Mo), tin (Sn), tungsten (W), and lead (Pb) of 100 pptw or less.
A method for handling a polycrystalline silicon rod, comprising handling the polycrystalline silicon rod that has been synthesized by Siemens method, while keeping the polycrystalline silicon rod in a vinyl bag,
A method for selecting a vinyl bag for packing a polycrystalline silicon rod that has been synthesized by Siemens method,
Dependencies are inferred from the claim text.