Gas screening film and manufacturing method thereof and face mask

A manufacturing method of a gas screening film, wherein the gas screening film comprises at least one gas screening element, the manufacturing method comprises:

• forming the at least one gas screening element such that each of the at least one the gas screening element comprises a transistor, which comprises a gate, an insulation spacing layer, a first electrode, a semiconductor nanosheet separation layer and a second electrode, the insulation spacing layer is disposed between the gate and the semiconductor nanosheet separation layer, and the semiconductor nanosheet separation layer is configured to perform gas screening and/or gas detection by changing a concentration of carriers in the semiconductor nanosheet separation layer.