Loading patent…
AssigneeIneos Americas, LLC
InventorsEric Matthew Teletzke, Flavia Mariana Dos Santos Bates, Brett Christopher Roberts, Erik John Stewart, Kathleen Yvonne Turk
Estimating the term…
A scrubbing solution for removing contaminants, including particularly hydrogen sulfide, from a fluid. The scrubbing solution includes at least one scrubbing reagent which has a primary or secondary amine and an acid, which may be phosphoric acid. The fluid being scrubbed is passed through the scrubbing solution. The contaminants react with the scrubbing reagent securing them in the scrubbing solution. The fluid being scrubbed and the scrubbing solution are then separated. The scrubbing solution is heated and, if the scrubbing solution is under pressure, the pressure is reduced. The acid facilitates thorough removal of the contaminants, and especially the hydrogen sulfide, from the scrubbing solution. The scrubbing solution is then ready for reuse. Because the scrubbing solution is rendered substantially free of hydrogen sulfides, it can absorb other sulfide contaminants that might not otherwise be absorbed.
A scrubbing solution comprising at least one scrubbing reagent, an acid, and water, wherein said scrubbing reagent has at least one primary or secondary amine and wherein the acid is selected from the group consisting of phosphoric acids, sulfuric acids, and combinations thereof, wherein the solution has a ratio of moles of acid to moles of amine, wherein the ratio of moles of acid to moles of amine is between about 0.018 and about 0.036, wherein the scrubbing reagent is selected from the group consisting of methyl diethanolamine and piperazine and combinations thereof, wherein the methyl diethanolamine comprises between about 20 and about 60 percent by weight of the scrubbing solution, and wherein the piperazine comprises between about 0.1 and about 10 percent by weight of the scrubbing solution.
Dependencies are inferred from the claim text.