Photo-imprinting curable composition and pattern transferring method using the same

A pattern transferring method comprising:

• a step of arranging a patterned object onto a workpiece, the patterned object comprising a cured product of the photo-imprinting curable composition comprising a polymerizable compound (A) containing a silicon atom in the molecule, a photopolymerization initiator (B) and an additive (C), the additive (C) being a compound represented by the following formula (C1) or (C2):
• R1OC2H4OnX1 Formula (C1)
• X2OC2H4OpC3H6OqC2H4OrX3 Formula (C2)
• in the formula (C1), R1 is a C12-30 alkyl group, X1 is an acryloyl group or a methacryloyl group, and n is an integer of 0 to 50, and in the formula (C2), X2 and X3 are each independently a hydrogen atom or an acyl group, and p, q and r are each independently an integer of 1 to 50;
• wherein the content of the additive (C) is 0.1 to 5 wt %;
• and
• wherein the value represented by MEO/(MEO+MPO) of the compound of the formula (C2) is 0.1 to 0.4, where MEO is the formula weight of the polyethylene oxide units in the formula (C2), and MPO is the formula weight of the polypropylene oxide unit in the formula (C2), a step of etching the workpiece while using the cured product as an etching mask, and a step of transferring a pattern to the workpiece.