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US 11,222,787 B2Granted
Patterning sheet and etched structure production method
AssigneeKaneka Corporation
InventorTakashi Kuchiyama
Life of this patent
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Abstract
A patterning sheet, or the like, is suitable when a complex etching target is to be etched in a simple manner to produce an etched structure. This patterning sheet comprises a base sheet formed from an etching-solution permeable first polymer, and particles dispersed in the base sheet and formed from a second polymer, which absorbs and holds the etching solution.
Claims8
A patterning sheet, comprising:
- a base sheet formed from a first polymer, the first polymer being permeable to an etching-solution;
- and
- particles which are formed from a second polymer that absorbs and holds the etching-solution, the particles being dispersed in the base sheet,
- wherein the first polymer contains:
- a polyether-based polymer having an alkenyl group;
- an organohydrosiloxane compound having a hydrosilyl group;
- and
- a platinum-vinyl siloxane catalyst.
5 more elements
Dependencies are inferred from the claim text.