Back to results
US 11,214,713 B2Granted
Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk
AssigneeHoya Corporation
InventorToshio Takizawa
Life of this patent
Estimating the term…
Abstract
Letting a particle diameter be Dx (μm) when a cumulative particle volume cumulated from the small particle diameter side reaches x (%) of the total particle volume in a particle size distribution obtained regarding cerium oxide included in a polishing liquid using a laser diffraction/scattering method, D5 is 1 μm or less, and a difference between D95 and D5 is 3 μm or more.
Claims20
A polishing liquid that contains cerium oxide as loose abrasive particles and is to be used in polishing processing for polishing an edge surface of a glass substrate with use of a brush,
- wherein, letting a particle diameter be Dx (μm) when a cumulative particle volume cumulated from the small particle diameter side reaches x (%) of a total particle volume in a particle size distribution obtained regarding the cerium oxide using a laser diffraction/scattering method,
- D5 is 1 μm or less,
- a difference between D95 and D5 is 3 μm or more, and
- wherein when a particle diameter at which a frequency is at the maximum in the particle size distribution is Dpeak, Dpeak-D5 is less than D95-Dpeak.
1 more element
Dependencies are inferred from the claim text.