Resistive element for PCM RPU by trench depth patterning
AssigneeInternational Business Machines Corporation
InventorGuy M. Cohen
Life of this patent
Estimating the term…
Abstract
Resistive elements for PCM RPUs and techniques for fabrication thereof using trench depth pattering are provided. In one aspect, an RPU device includes: a first electrode; a second electrode; a heater; and a PCM disposed over the first electrode, the second electrode and the heater, wherein the heater includes a combination of a first material having a resistivity r1 and a second material having a resistivity r2, wherein r1>r2, and wherein only the first material is present beneath the PCM and forms a resistive heating element. A method of operating an RPU device is also provided.
Claims19
A resistive processing unit (RPU) device, comprising:
- a first electrode;
- a second electrode;
- a heater;
- and
- a phase change material (PCM) disposed over the first electrode, the second electrode and the heater,
- wherein the heater comprises a combination of a first material having a resistivity r1 and a second material having a resistivity r2, wherein r1>r2, and wherein only the first material is present beneath the PCM and comprises a resistive heating element.
A method of forming an RPU device, the method comprising the steps of:
- forming a first electrode and a second electrode on a substrate, wherein the first electrode is oriented parallel to the second electrode;
- forming a heater on the substrate in between the first electrode and the second electrode;
- and
- depositing a PCM onto the first electrode, the second electrode and the heater.
A method of operating an RPU device, the method comprising the steps of:
- providing the RPU device comprising:
- a first electrode, a second electrode, a heater, and a PCM disposed over the first electrode, the second electrode and the heater;
- and
- applying a programming pulse to the heater to convert at least a portion of the PCM from a poly-crystalline state to an amorphous state.
Dependencies are inferred from the claim text.