Multi charged particle beam evaluation method and multi charged particle beam writing device

A multi charged particle beam evaluation method comprising

• writing a plurality of evaluation patterns on a substrate by using multi charged particle beams, with a design value of pitch changed by a predetermined change amount;
• measuring the pitches at which the plurality of evaluation patterns are written;
• and
• extracting a variation in a specific period of a distribution of differences between results of a measurement value and the design value of each of the pitches,
• wherein the predetermined change amount is smaller than a size of each of pixels, each of which is a unit region to be irradiated with one of the multi charged particle beams.

A multi charged particle beam evaluation method comprising

• writing a plurality of evaluation patterns each of which have a design value of a line width, on a substrate by using multi charged particle beams, with a predetermined pitch;
• measuring line widths and the pitch of the plurality of evaluation patterns thus written;
• and
• extracting a variation in a specific period of a distribution of differences between results of a measurement value and the design value of each of the line widths of the plurality of evaluation patterns,
• wherein
• each of the evaluation patterns has a plurality of rectangular parts that are connected so as to be shifted from each other in a width direction,
• a width by which the plurality of rectangular parts are shifted from each other is equal to or larger than data resolution and is smaller than a size of each of pixels, each of which is a unit region to be irradiated with one of the multi charged particle beams, and
• a line width of each of the plurality of rectangular parts is measured.