Systems and methods for improved sustainment of a high performance FRC with multi-scaled capture type vacuum pumping

A system for generating and maintaining a magnetic field with a field reversed configuration (FRC) comprising

• a confinement chamber,
• first and second diametrically opposed FRC formation sections,
• first and second divertors coupled to the first and second formation sections, wherein the first and second divertors include first and second capture vacuum pumps positioned within the first and second divertors, respectively, and each comprising an open sided chamber including an end plate having a surface and two or more sides plates with surfaces facing each other, the two or more side plates being coupled to the end plate at a first end of the two or more side plates and extending to an opening defined by a second end of the two or more side plates, wherein the opening defining an area equivalent to the surface of the end plate, wherein the first and second capture vacuum pumps having a sticking factor more than four (4) times greater than a sticking factor of a surface of a flat plate defining an area equivalent to the opening of the first and second capture vacuum pumps,
• wherein at least one of the two or more side plates of the first and second capture vacuum pumps comprising an array of individual capture vacuum pumps,
• wherein each of the individual capture vacuum pumps comprising an end plate having a surface and two or more side plates with surfaces facing each other and each coupled to the end plate at a first end of the two or more side plates and extending to an opening defined by a second end of the two or more side plates, wherein the opening defining an area equivalent to the surface of the end plate, wherein each of the individual capture vacuum pumps having a sticking factor greater than a sticking factor of a surface of a flat plate defining an area equivalent to the opening of each of the individual capture vacuum pumps,
• one or more of a plurality of plasma guns, one or more biasing electrodes and first and second mirror plugs, wherein the plurality of plasma guns includes first and second axial plasma guns operably coupled to the first and second divertors, the first and second formation sections and the confinement chamber, wherein the one or more biasing electrodes being positioned within one or more of the confinement chamber, the first and second formation sections, and the first and second divertors, and wherein the first and second mirror plugs being positioned between the first and second formation sections and the first and second divertors,
• a gettering system coupled to the confinement chamber and the first and second divertors,
• a plurality of neutral atom beam injectors coupled to the confinement chamber and angled toward a mid-plane of the confinement chamber, and
• a magnetic system comprising a plurality of quasi-dc coils positioned around the confinement chamber, the first and second formation sections, and the first and second divertors, and first and second set of quasi-dc mirror coils positioned between the first and second formation sections and the first and second divertors.