Systems and methods for controlling flow distribution in an aftertreatment system

An aftertreatment component, comprising:

• an inlet that receives exhaust gas;
• an outlet;
• a chamber positioned between the inlet and the outlet;
• a flow dissipater positioned around the inlet, wherein the flow dissipater is configured to receive the exhaust gas from the inlet, and wherein the flow dissipater has a first shape;
• and
• a substrate located within the chamber, wherein the substrate extends around the flow dissipater and is configured to receive the exhaust gas from the flow dissipater and to provide treated exhaust gas to the outlet, and wherein the substrate has a second shape;
• wherein the first shape and the second shape cooperate to form a radial gap extending an entire distance between the flow dissipater and the substrate, the radial gap having a first length proximate to the inlet and a second length, larger than the first length, proximate to the outlet.

An aftertreatment system, comprising:

• a first aftertreatment component configured to provide exhaust gas;
• a second aftertreatment component configured to receive treated exhaust gas;
• and
• a third aftertreatment component that is configured to receive the exhaust gas from the first aftertreatment component and to provide the treated exhaust gas to the second aftertreatment component, the third aftertreatment component comprising:
• a flow dissipater configured to receive the exhaust gas from the first aftertreatment component in an axial flow and to provide the exhaust gas in a radial flow, wherein the flow dissipater comprises a plurality of perforations and a plurality of vanes configured to cooperatively redirect the axial flow to the radial flow;
• and
• a substrate that extends around the flow dissipater, is separated from the plurality of vanes, and is configured to receive the exhaust gas from the flow dissipater and to provide the treated exhaust gas to the second aftertreatment component.