Methods and apparatuses for effluent monitoring for brush conditioning

A system for monitoring contamination level of effluent of an offline brush conditioning system, the system comprising:

• a first set of reservoirs configured to collect first effluents from corresponding portions of a first brush in a first brush station in the offline brush conditioning system;
• a second set of reservoirs configured to collect second effluents from corresponding portions of a second brush in a second brush station, wherein the first and second effluents are from a fluid used to condition the first and second brushes that are configured to clean a surface of a semiconductor wafer;
• and
• an effluent contamination monitor configured to monitor contamination levels of the first effluent from the first set of reservoirs and contamination levels of the second effluent from the second set of reservoirs.