Methods of forming devices on a substrate
AssigneeApplied Materials, Inc.
InventorsJoseph C. Olson, Ludovic Godet, Rutger Meyer Timmerman Thijssen, Morgan Evans, Jinxin Fu
Life of this patent
Estimating the term…
Abstract
Embodiments of the disclosure relate to systems and methods for forming devices on a substrate. For example, a method for forming devices on a substrate can include projecting one or more ion beams from one or more ion beam chambers to form one or more devices on a first surface of a substrate and projecting one or more ion beams from one or more ion beam chambers to form one or more devices on a second surface of a substrate. In these embodiments, the first surface and the second surface are on opposite sides of the substrate. Therefore, the ion beams can form the devices on both sides of the substrate.
Claims15
A method for forming devices on a substrate, comprising:
- projecting one or more first ion beams from one or more first ion beam chambers positioned over a first side of a rolling system, wherein each of the first ion beam chambers project the one or more first ion beams toward a first surface of a substrate, the substrate retained by a pedestal coupled to a scanner;
- projecting one or more second ion beams from one or more second ion beam chambers positioned over a second side of a rolling system, wherein each of the second ion beam chambers project the one or more second ion beams toward a second surface opposite to the first surface of the substrate;
- and
- scanning the pedestal proximate to the substrate with the scanner such that the first ion beams or the second ion beams pass through one or more holes of the pedestal.
A system for forming devices on a substrate, comprising:
- one or more first ion beam chambers positioned over a first side of a rolling system, each of the first ion beam chambers operable to project one or more first ion beams toward a first surface of a substrate, wherein at least one first ion beam chamber is operable to project a first ion beam at a first angle;
- and
- one or more second ion beam chambers positioned over a second side of the rolling system opposite of the first side, each of the second ion beam chambers operable to project one or more second ion beams toward a second surface of the substrate, wherein the first surface and the second surface are on opposite sides of the substrate and at least one second ion beam chamber is operable to project a second ion beam at a second angle different from the first angle;
- and
- a pedestal operable to retain the substrate, the pedestal coupled to a scanner, the pedestal having one or more holes to allow the first ion beams or the second ion beams to pass therethrough, the scanner operable to move the pedestal proximate to the substrate.
A system for forming devices on a substrate, comprising:
- one or more first ion beam chambers positioned over a first side of a rolling system, each of the first ion beam chambers operable to project one or more first ion beams toward a first surface of a substrate;
- one or more second ion beam chambers positioned over a second side of the rolling system opposite of the first side, each of the second ion beam chambers operable to project one or more second ion beams toward a second surface of a substrate, wherein the first surface and the second surface are on opposite sides of the substrate;
- and
- a pedestal operable to retain the substrate, the pedestal coupled to a scanner, the pedestal having one or more holes to allow the first ion beams or the second ion beams to pass therethrough, the scanner operable to move the pedestal proximate to the substrate.
Dependencies are inferred from the claim text.