Base material processing apparatus and detection method
AssigneeSCREEN Holdings Co., Ltd.
InventorsMitsuhiro Yoshida, Yuichi Hanada
Life of this patent
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AssigneeSCREEN Holdings Co., Ltd.
InventorsMitsuhiro Yoshida, Yuichi Hanada
Estimating the term…
A base material processing apparatus includes a first edge sensor, a second edge sensor, and a displacement amount calculation part. The first edge sensor acquires a first detection result (R1) by detecting the position of an edge of a base material in the width direction at a first detection position. The second edge sensor acquires a second detection result (R2) by detecting the position of the edge of the base material in the width direction at a second detection position. The displacement amount calculation part calculates the amount of displacement in the position of the base material in the transport direction on the basis of the first detection result (R1) and the second detection result (R2). Accordingly, the amount of displacement in the position of the base material in the transport direction can be detected without depending on images such as register marks.
A base material processing apparatus comprising:
A detection method of detecting an amount of displacement in a position of a long band-like base material in a transport direction while transporting the base material in a longitudinal direction along a predetermined transport path, the detection method comprising:
Dependencies are inferred from the claim text.