X-ray dark-field in-line inspection for semiconductor samples
AssigneeSigray, Inc.
InventorsWenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
Life of this patent
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AssigneeSigray, Inc.
InventorsWenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
Estimating the term…
An x-ray imaging/inspection system includes an x-ray source having a plurality of sub-sources in thermal communication with a substrate. The system further includes a first grating positioned to receive at least some of the x-rays from the x-ray source, a stage configured to hold a sample positioned to receive at least some of the x-rays from the x-ray source, at least one x-ray detector, and a second grating having periodic structures. The x-ray source, the first grating, and the second grating are configured such that a ratio of a pitch p0 of the plurality of sub-sources to a pitch p2 of the periodic structures of the second grating is substantially equal to a ratio of a distance dS-G1 between the plurality of sub-sources and the first grating and a distance dG1-G2 between the first grating and the second grating: (p0/p2)=(dS-G1/dG1-G2).
An x-ray imaging/inspection system comprising:
Dependencies are inferred from the claim text.