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US 11,174,338 B2Granted
Curable composition for use in a high temperature lithography-based photopolymerization process and method of producing crosslinked polymers therefrom
AssigneeAlign Technology, Inc.
InventorsRobert Liska, Christian Gorsche, György Harakaly, Markus Kury, Jürgen Stampfl, Peter Dorfinger, Yan Chen, Chunhua Li, Srinivas Kaza
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Abstract
Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.
Claims18
A curable composition for use in a photopolymerization process, the composition comprising:
- a toughness modifier, wherein the toughness modifier is a polymerizable oligomer having a number average molecular weight of greater than 5 kDa, wherein the toughness modifier is the polymerizable oligomer selected from one of Formula (II), (III), (IV), and (V):
- wherein:
- each R4 and each R5 independently represent a divalent, linear, branched or cyclic C5-C15 aliphatic radical;
- each R6 independently represents a divalent, linear or branched C2-C4 alkyl radical;
- each R7 independently represents a divalent, linear, branched C2-C6 alkyl radical, or is absent;
- each n is independently an integer from 1 to 10;
- each m is independently an integer from 1 to 20;
- each o is independently an integer from 5 to 50 or is absent;
- and
- p is an integer from 1 to 40 or is absent;
- and
- a reactive diluent, wherein the reactive diluent is a cycloalkyl 2-((meth)acryloxy)benzoate, wherein the cycloalkyl 2-((meth)acryloxy)benzoate is a cyclopropyl 2-((meth)acryloxy)benzoate, wherein the reactive diluent is a polymerizable compound having a molecular weight of 0.1 to 1.0 kDa and wherein the content of the reactive diluent is such that the viscosity of the composition is 1 to 70 Pa·s at 110° C.
9 more elements
A curable composition for use in a photopolymerization process, the composition comprising:
- a toughness modifier, wherein the toughness modifier is a polymerizable oligomer having a number average molecular weight of greater than 5 kDa, wherein the toughness modifier is the polymerizable oligomer selected from one of Formula (II), (III), (IV), and (V):
- wherein:
- each R4 and each R5 independently represent a divalent, linear, branched or cyclic C5-C15 aliphatic radical;
- each R6 independently represents a divalent, linear or branched C2-C4 alkyl radical;
- each R7 independently represents a divalent, linear, branched C2-C6 alkyl radical, or is absent;
- each n is independently an integer from 1 to 10;
- each m is independently an integer from 1 to 20;
- each o is independently an integer from 5 to 50 or is absent;
- and
- p is an integer from 1 to 40 or is absent;
- and
- a reactive diluent, wherein the reactive diluent is a cycloalkyl 2-((meth)acryloxy)benzoate, wherein the cycloalkyl 2-((meth)acryloxy)benzoate is a cyclopropyl 2-((meth)acryloxy)benzoate, wherein the reactive diluent is a polymerizable compound having a molecular weight of 0.1 to 1.0 kDa and wherein the content of the reactive diluent is such that the viscosity of the composition is less than 70 Pa·s at 90° C.
9 more elements
Dependencies are inferred from the claim text.