Template, method for manufacturing template, and pattern formation method
AssigneeToshiba Memory Corporation
InventorsKoji Asakawa, Shinobu Sugimura
Life of this patent
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Abstract
According to one embodiment, a template includes a base body, and a first film. The base body has a first surface and a second surface. The first surface includes silicon oxide and spreads along a first plane. The second surface crosses the first plane. The first film includes aluminum oxide. A direction from the second surface toward the first film is aligned with a direction perpendicular to the second surface. A thickness of the first film along the direction perpendicular to the second surface is not less than 0.3 nm and not more than 10 μm. The first surface includes an unevenness.
Claims11
A method for manufacturing a template, comprising:
- preparing a base body having a first surface and a second surface, the first surface including silicon oxide and spreading along a first plane, the second surface crossing the first plane;
- forming an intermediate film on the second surface of the base body, the intermediate film including silicon as a main component;
- forming a first film on the intermediate film, the first film including aluminum oxide;
- and
- forming a second film on the first film, the second film including at least one of a phosphonic acid or a phosphonic acid compound, the phosphonic acid including fluoroalkyl, the phosphonic acid compound including fluoroalkyl.
Dependencies are inferred from the claim text.