Extreme ultraviolet photolithography method
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsMing-Hsun Tsai, Han-Lung Chang, Yen-Hsun Chen, Shao-Hua Wang, Li-Jui Chen, Po-Chung Cheng
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Abstract
An extreme ultraviolet (EUV) lithography method includes causing a first metallic droplet to move along a shroud and through an aperture of the shroud at a first velocity, and adjusting an open area of the aperture of the shroud. After adjusting the open area of the aperture of the shroud, a second metallic droplet is caused to move along the shroud and through the aperture of the shroud at a second velocity, in which the second velocity is different from the first velocity.
Claims20
A method, comprising:
- causing a first metallic droplet to move along a shroud and through an aperture of the shroud at a first velocity;
- adjusting an open area of the aperture of the shroud;
- and
- after adjusting the open area of the aperture of the shroud, causing a second metallic droplet to move along the shroud and through the aperture of the shroud at a second velocity, wherein the second velocity is different from the first velocity.
A method, comprising:
- causing, using a droplet generator, a first metallic droplet to move along a shroud to an excitation region with a first velocity, wherein the shroud has a first opening adjacent the droplet generator, a second opening adjacent the excitation region, and a shutter cover disposed at the second opening of the shroud, wherein the shutter cover and the excitation region are separated by a space, and the shroud is absent from the space;
- causing, using the droplet generator, a second metallic droplet to move along the shroud to the excitation region with a second velocity that is different from the first velocity;
- and
- varying an open area of the shutter cover of the shroud after causing the second metallic droplet to move along the shroud.
A method, comprising:
- causing a first metallic droplet to move along a shroud and through an aperture of the shroud;
- increasing an open area of the aperture of the shroud;
- and
- after increasing the open area of the aperture of the shroud, causing a second metallic droplet to move along the shroud and through the aperture of the shroud, wherein a first location at which the first metallic droplet moves through the aperture of the shroud is closer to a center of the aperture of the shroud than a second location at which the second metallic droplet moves through the aperture of the shroud is to the center of the aperture of the shroud.
Dependencies are inferred from the claim text.