Contact and method of manufacturing same
AssigneeKitagawa Industries Co., Ltd.
InventorsTatsuya Nakamura, Hiroyoshi Ishiguro
Life of this patent
Estimating the term…
Loading patent…
AssigneeKitagawa Industries Co., Ltd.
InventorsTatsuya Nakamura, Hiroyoshi Ishiguro
Estimating the term…
The present invention provides a contact capable of suppressing an increase in a DC resistance value for a long period and a method of manufacturing the same. The contact includes a base portion and an elastic contact portion. The elastic contact portion includes a planar portion configured in a planar shape; and a projection portion that is disposed on one surface of the planar portion and protrudes from the one surface. The elastic contact portion is configured to come into pressed contact with the second surface at the projection portion. The projection portion is configured such that a dimensional ratio H/L of the height H to the length L satisfies 0.25≤H/L≤0.44, where H is a height in a direction perpendicular to the one surface and L is a length in a direction parallel to the one surface.
A contact capable of electrically connecting a first surface and a second surface that is disposed perpendicular to the first surface, the contact comprising:
A method of manufacturing a contact capable of electrically connecting a first surface and a second surface that is disposed perpendicular to the first surface,
Dependencies are inferred from the claim text.