Weighing apparatus, substrate liquid processing apparatus, weighing method, substrate liquid processing method and recording medium
AssigneeTokyo Electron Limited
InventorsTeruaki Konishi, Kazusige Sano, Koji Tanaka
Life of this patent
Estimating the term…
Abstract
A processing liquid used in a substrate liquid processing apparatus can be supplied in a constant amount with high accuracy. A substrate liquid processing apparatus A1 includes a storage line 61 configured to store a processing liquid therein; an introduction line 62 configured to introduce the processing liquid into the storage line 61; a discharge line 63 configured to discharge the processing liquid from the storage line 61; and a gas supply unit 65 configured to perform a strickling of the processing liquid by jetting a gas to a surface of the processing liquid stored in the storage line 61.
Claims14
A weighing apparatus, comprising:
- a storage line configured to store a processing liquid therein;
- an introduction unit, including an introduction line, configured to introduce the processing liquid into the storage line;
- a discharge unit, including a discharge line, configured to discharge the processing liquid from the storage line;
- a reception line branched from and extended from the storage line in a direction orthogonal to the storage line;
- a gas supply unit configured to jet a gas from one end of the storage line toward a surface of the processing liquid stored within the storage line in order to press the processing liquid so as to remove an excess target storage amount of the processing liquid by flowing the processing liquid, stored in a portion of the storage line to which the reception line is connected, toward the reception line;
- a first valve configured to adjust a flow of the processing liquid in the introduction line;
- a second valve configured to adjust a flow of the processing liquid in the discharge line;
- a third valve configured to adjust a flow of the processing liquid in the reception line;
- and
- a control unit,
- wherein the control unit is configured to perform:
- a storage control of storing the processing liquid introduced from the introduction line in the storage line by opening the first valve and the third valve while closing the second valve;
- and
- an excess target storage amount removal control of controlling, after the storage control, the gas supply unit to perform the excess target storage amount removal of the processing liquid by closing the first valve and jetting the gas into the storage line while the third valve remains open.
Dependencies are inferred from the claim text.