Methods and systems for inclusion analysis
AssigneeFEI Company
InventorsJean-Marc Bohlen, Cornelis van Beek
Life of this patent
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Abstract
Various methods and systems are provided for analyzing sample inclusions. As one example, a correction factor may be generated based on inclusion properties of a first sample determined using both an optical emission spectrometry (OES) system and a charged-particle microscopy with energy dispersive X-ray spectroscopy (CPM/EDX) system. The OES system may be calibrated with the correction factor. The inclusion properties of a second, different, sample may be determined using the calibrated OES system.
Claims20
A method for analyzing sample inclusions, comprising:
- generating a correction factor based on inclusion properties of a first sample determined using both an optical emission spectrometry (OES) system and a charged-particle microscopy with energy dispersive X-ray spectroscopy (CPM/EDX) system, and determining an inclusion property of a second, different, sample using the OES system calibrated with the correction factor.
A method for analyzing sample inclusions, comprising:
- generating a first set of inclusion properties of a first sample using an optical emission spectrometry (OES) system;
- updating a charged-particle microscopy with energy dispersive X-ray spectroscopy (CPM/EDX) system based on the first set of inclusion properties;
- generating a second set of inclusion properties of the first sample using the updated CPM/EDX system;
- generating a correction factor based on the first set inclusion properties and the second set of inclusion properties;
- calibrating the OES system with the correction factor;
- and
- analyzing a second, different, sample using the calibrated OES system.
A system for analyzing sample inclusions, comprising:
- an optical emission spectrometry (OES) system;
- a charged-particle microscopy with energy dispersive X-ray spectroscopy (CPM/EDX) system;
- and
- a controller with computer readable instructions stored on a non-transitory memory configured to:
- generate a correction factor based on inclusion properties of a first sample determined using both the OES system and the CPM/EDX system;
- calibrate the OES system based on the correction factor;
- and
- determine inclusion properties of a second, different, sample using the calibrated OES system.
Dependencies are inferred from the claim text.