Photothermal modification of plasmonic structures
AssigneeDanmarks Tekniske Universitet
InventorsXiaolong Zhu, Anders Kristensen, Emil Højlund-Nielsen, Christoph Vannahme, Niels Asger Mortensen
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AssigneeDanmarks Tekniske Universitet
InventorsXiaolong Zhu, Anders Kristensen, Emil Højlund-Nielsen, Christoph Vannahme, Niels Asger Mortensen
Estimating the term…
There is presented a method for geometrically modifying plasmonic structures on a support structure, such as for printing or recording, said method comprising changing a geometry specifically of plasmonic structures, wherein said changing the geometry is carried out by photothermally melting at least a portion of each of the plasmonic structures within the second plurality of plasmonic structures by irradiating, the plasmonic structures with incident electromagnetic radiation having an incident intensity in a plane of the second plurality of plasmonic structures, wherein said incident intensity is less than an incident intensity required to melt a film of a corresponding material and a corresponding thickness as the plasmonic structures within the second plurality of plasmonic structures.
A method for geometrically modifying plasmonic structures on a support structure, said method comprising:
Dependencies are inferred from the claim text.