Semiconductor apparatus and method for manufacturing the same
AssigneeMitsubishi Electric Corporation
InventorsTetsu Negishi, Shoichi Kuga
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AssigneeMitsubishi Electric Corporation
InventorsTetsu Negishi, Shoichi Kuga
Estimating the term…
A semiconductor apparatus includes a power semiconductor device, a resin film and a sealing insulating material. The power semiconductor device includes: a first electrode covering a first region on one main surface of the semiconductor substrate; a second electrode formed on the other main surface of the semiconductor substrate; a guard ring formed in a second region outer than the first region; and a non-conductive inorganic film located in the second region and covering the guard ring. The resin film overlaps the guard ring in a plan view, and the resin film on the non-conductive inorganic film has a thickness of 35 μm or more. The resin film is a film of a single layer, and the resin film has an outermost edge in the form of a downwardly spreading fillet. The outermost edge of the resin film is inner than an outermost edge of the semiconductor substrate.
A semiconductor apparatus, comprising:
Dependencies are inferred from the claim text.