Semiconductor device and methods of manufacturing
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsHung-Jui Kuo, Hsing-Chieh Lee, Ming-Tan Lee
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Abstract
A photoresist with a detection additive is utilized to help increase the contrast of images during an after development inspection process. The detection additive fluoresces during the after development inspection process and adds to the energy that is reflected during the after development inspection process, increasing the contrast during the after development inspection process and helping to identify defects that are not otherwise detectable.
Claims20
A method of manufacturing a semiconductor device, the method comprising:
- applying a photoresist over a semiconductor substrate, the photoresist comprising a detection additive, wherein the applying the photoresist applies the photoresist over a through insulator via and an encapsulant;
- exposing and developing the photoresist;
- and
- inspecting the photoresist after the developing the photoresist, wherein the detection additive fluoresces during the inspecting the photoresist.
A method comprising:
- placing a photoresist polymer resin into a photoresist solvent;
- placing a photoacid generator into the photoresist solvent;
- placing curcumin into the photoresist solvent;
- mixing the photoresist polymer resin, the photoacid generator, the curcumin, and the photoresist solvent to form a photoresist;
- and
- dispensing the photoresist onto a semiconductor substrate, wherein an encapsulant surrounds the semiconductor substrate.
A photoresist comprising:
- a photoresist polymer resin, wherein the photoresist polymer resin is located over a semiconductor substrate;
- a photoactive compound;
- and
- a detection additive, wherein the detection additive has a concentration within the photoresist of between about 0.01%-weight and about 0.03%-weight, wherein the photoresist polymer resin is located over an encapsulant around the semiconductor substrate.
Dependencies are inferred from the claim text.