Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium

A substrate processing method, comprising:

• (a) loading a substrate into a process container;
• (b) heating the substrate by supplying a first gas, which is heated when passing through a first heater installed at a first gas supply line, to the substrate via a gas supplier;
• (c) supplying a second gas, which flows through a second gas supply line different from the first gas supply line, to the substrate mounted on a substrate mounting table in the process container, via the gas supplier;
• and
• (d) lowering a temperature of the gas supplier by supplying a third gas, which has a temperature lower than that of the first gas, to the gas supplier between (b) and (c).

A substrate processing apparatus, comprising:

• a process container in which a substrate is accommodated;
• a transfer mechanism configured to transfer the substrate into the process container;
• a substrate mounting table configured to mount the substrate in the process container;
• a gas supplier configured to supply a gas to the substrate in the process container;
• a first gas supply line including a first heater and being configured to supply a first gas via the gas supplier;
• a second gas supply line configured to supply a second gas via the gas supplier;
• a third gas supply line configured to supply a third gas to the gas supplier;
• and
• a controller configured to be capable of controlling the transfer mechanism, the first gas supply line, the second gas supply line, and the third gas supply line to perform a process in the process container, the process comprising:
• (a) loading the substrate into the process container;
• (b) heating the substrate by supplying the first gas, which is heated when passing through the first heater installed at the first gas supply line, to the substrate via the gas supplier;
• (c) supplying the second gas, which flows through the second gas supply line different from the first gas supply line, to the substrate mounted on the substrate mounting table in the process container, via the gas supplier;
• and
• (d) lowering a temperature of the gas supplier by supplying the third gas, which has a temperature lower than that of the first gas, to the gas supplier between (b) and (c).

A non-transitory computer-readable recording medium storing a program that causes, by a computer, a substrate processing apparatus to perform a process in a process container of the substrate processing apparatus, the process comprising:

• (a) loading a substrate into the process container;
• (b) heating the substrate by supplying a first gas, which is heated when passing through a first heater installed at a first gas supply line, to the substrate via a gas supplier;
• (c) supplying a second gas, which flows through a second gas supply line different from the first gas supply line, to the substrate mounted on a substrate mounting table in the process container, via the gas supplier;
• and
• (d) lowering a temperature of the gas supplier by supplying a third gas, which has a temperature lower than that of the first gas, to the gas supplier between (b) and (c).