Plasma processing apparatus

A plasma processing apparatus configured to apply plasma processing to a substrate held by a carrier including a frame and a holding sheet, the plasma processing apparatus comprising:

• a chamber having a decompressible internal space;
• a plasma source configured to generate plasma in the chamber;
• a stage provided in the chamber, the stage being configured to place the carrier thereon, provided with a coolant flow path which is connected to a coolant circulator and a RF electrode which is electrically connected only to a high frequency power source, and an electrostatic attraction electrode which is electrically connected only to a DC power source, wherein the RF electrode is a single electrode;
• and
• a cover being configured to cover the holding sheet and the frame, and to have a window penetrating through the thickness of the cover, wherein
• the cover is covered with a protect part fixedly attached to the cover,
• a contact area between the protect part and the cover is reduced by forming irregularities or protrusions on, or roughening one or both of the protect part and the cover, and
• in a plan view, an outer diameter of the RF electrode is set so as to be disposed only inside of the window of the cover and the electrostatic attraction electrode is disposed both inside and outside of the window of the cover, and
• in the plan view, the protect part does not overlap the RF electrode.

A plasma processing apparatus configured to apply plasma processing to a substrate held by a carrier including a frame and a holding sheet, the plasma processing apparatus comprising:

• a chamber having a decompressible internal space;
• a plasma source configured to generate plasma in the chamber;
• a stage provided in the chamber, the stage being configured to place the carrier thereon, provided with a coolant flow path which is connected to a coolant circulator and a RF electrode which is electrically connected only to a high frequency power source, and an electrostatic attraction electrode which is electrically connected only to a DC power source, wherein the RF electrode is a single electrode;
• and
• a cover configured to cover the holding sheet and the frame, and to have a window penetrating through the thickness of the cover, wherein
• in a plan view, an outer diameter of the RF electrode is set so as to be disposed only inside of the window of the cover and the electrostatic attraction electrode is disposed both inside and outside of the window of the cover.